Instrument name | Plasma Cleaner |
Model | IoN 40 |
Manufacturer | PVA Tepla America Inc |
Specifications | 1.Reaction chamber: Size 229 mm*330 mm*483 mm； 2.Process Gas: O2 and Ar; 3.Vacuum System: pre-condition 50mTorr; Process Pressure 120-2000mTorr 4.RF Power: Frequency 13.56MHZ, Power Adjust Range is 0-300W. 5.Control System: Automatic Control |
Function and applications | The PVA TePla ION Series Plasma Processing System is a batch-mode plasma system for etch, strip, clean, and surface treatment, which could be widely used in the field of semiconductor technology and biotechnology. It combines field-proven features, which minimize machine-generated particulate with the process flexibility of computer control. |
Accessories | Dry Pump |
Contacts: Wenchang Zhu | |
Contact number: 65881259 | |
E-mail: wczhu@suda.edu.cn | |
Editor: Wenchang Zhu