Instrument name | Atomic Layer Deposition System (ALD) |
Model | Savannah-100 |
Manufacturer | Cambridge Nano Tech |
Specifications | 1.Precursor Source: There are four kinds of precursor sourcs, three of them could be heated, but the fourth one could not be heated. 2.Sample Size: Up to 4” 3.Deposition Temperature: The maximum temperature is ～300 ℃ 4. Carrier Gas: N2, MFC control is 10-1000 sccm. |
Function and applications | Atomic Layer Deposition System (ALD) is a self-limiting process capable of precise monolayer growth, which is mainly used for the dielectric layer thin film deposition in the field of nano field-effect transistor (FET) and organic light emitting diode (OLED). |
Accessories | Mechanical Pump |
Contacts: Wenchang Zhu | |
Contact number: 65881259 | |
E-mail: wczhu@suda.edu.cn | |
Editor: Wenchang Zhu